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Coater/Developer

 

SUSS MicroTec spin coaters and spray coaters enhance the coating mastery with premium performance, ease of use, and flexibility. SUSS MicroTec supports production from low-volume laboratory tools to high-end production systems up to 300mm wafer with a lineup of compact and user-friendly resist coating equipment.

 

ACS300 Gen3

ACS300Gen3

 

By offering multiple process technologies such as photo resist, polyimide and PBO coating within one system, ACS300 Gen3 delivers high efficiency. It also optimizes the process flexibly by enabling to use up to five resist or four develop chemistries per module. Moreover, the universal hotplate design eliminates the need for specific hotplates for different resist or PI types. ACS300 Gen3 allows simultaneous 200 and 300mm wafer processing without mechanical changeover.

ACS200 Gen3

ACS200 Gen3

ACS200 Gen3 is capable of up to 4 wet process modules and a maximum of 19 plates and is the fully-automated equipment with necessary functionality for high volume manufacturing (HVM). The unmatched configuration flexibility of process modules and technologies not only covers the requirements of the Advanced Packaging, MEMS and LED market but also bridges the performance gap between R&D and HVM.

RCD8

RCD8

 

RCD8 can be customized anywhere from e.g. a basic manual spin coater to a GYRSET® (SUSS MicroTec’s patent) enhanced coater. It can handle small pieces as well as standard wafers up to 200mm and serves therefore ideally for daily R&D work up to small scale production.


AS8/AS12

AS8/AS12

 

SUSS MicroTec AS8/AS12 is a semi-automated spray coater designed for R&D. Substrates up to 200mm - 300mm in diameter and square substrates up to 6" edge length can be processed. AS8/AS12 offers unmatched process stability and reproducibility with the sophisticated resist supply system.


LabSpin

LabSpin

 

SUSS MicroTec‘s LabSpin platform represents the next generation manual spin coater and developer systems that have been developed specifically for laboratory and R&D. LabSpin system provides the uniform and repeatable spin coating results on the wafer through its advanced coating up design.

 

 

HP8

HP8

 

SUSS MicroTec's manual hot plate HP8 has been developed specifically to meet the requirements of R&D work and small scale production. It offers the homogeneous temperature distribution as well as heating ramps with high repeating accuracy to ensure constant and stable process results.


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